University of Groningen and ASML sign contract for strategic collaboration

Veldhoven, 5 December 2025 – Today, the University of Groningen (UG) and ASML signed an important framework agreement for more intensive research collaboration. This step builds on existing contacts and opens the door to new projects in areas such as advanced materials, flow processes, and advanced control technology, which are important for the development of future technologies for the manufacture of computer chips.

The signing took place during a meeting at ASML in Veldhoven. The program included presentations by Joost Frenken (Dean of the Faculty of Science and Engineering, UG) and Maarten Voncken (Head of Research Metrology ASML), followed by the official signing of the agreement by Jouke de Vries (Chair of the Board, UG) and Richard Kemkers (Head of Research at ASML).

Background to the collaboration

The collaboration between ASML and the UG, in particular the Faculty of Science & Engineering (FSE), builds on a long history, partly initiated by Ronnie Hoekstra, who has been active within the Advanced Research Center for Nanolithography (ARCNL) since 2014. In June 2023, both parties organized an ‘ASML Day’ in Groningen to familiarize students with the semiconductor industry, which uses semiconductors to make computer chips. At the same time, in-depth explorations took place into opportunities for intensive collaboration between researchers and experts from ASML and FSE in the field of research and development.

Chair of the Board Jouke de Vries responds enthusiastically: 'The UG-ASML framework agreement strengthens our long-standing collaboration with ASML and lays a solid foundation for future innovation. This will enable new projects to be launched more quickly on a variety of research topics, with Groningen contributing its unique expertise, such as that of the CogniGron program, and state-of-the-art AI infrastructure. The agreement also emphasizes ASML's strategic commitment to the UG as a technical university.'

Research projects

The long-standing collaboration with ASML via the NWO institute ARCNL, which involves the use of the University of Groningen's Zernike-LEIF ion beam facility, has yielded important knowledge in the context of ASML's EUV (extreme ultraviolet) lithography technology for the manufacture of the most complex computer chips. This collaboration has recently been further intensified with a new project focusing on the next generation of chip exposure technology, in which even finer patterns can be applied to chips using shorter wavelength light.

In addition, there is also close cooperation in other areas, and new joint research projects have been launched in the fields of new materials, fluid and flow processes, special coatings, and advanced control technology. This research provides crucial insights that play a role in the development of future ASML machines and are therefore important for future generations of microchips.

Head of Research Richard Kemkers is positive: 'We are delighted to sign this framework agreement with the University of Groningen. This agreement lays a solid foundation for future joint projects and accelerates the launch of new initiatives. We look forward to a fruitful collaboration that will further strengthen innovation and knowledge sharing.'

Collaboration and talent development

This new framework agreement focuses entirely on research. Talent development also plays an important role within the ecosystem of the Dutch semiconductor industry. Together with other knowledge institutions in the north of the Netherlands and parties associated with the University of Twente, Eindhoven University of Technology, and Delft University of Technology, the UG participates in the Beethoven program, which aims to prepare substantially more talented individuals for careers in this unique Dutch high-tech industry through science and engineering programs.