Rai, S., Bijlsma,
K. I., Poirier, L., de Wit, E.,
Assink, L., Lassise, A., Rabadán,
I., Méndez, L., Sheil, J., Versolato, O. O. & Hoekstra, R., Mar-2023, In:
Plasma Sources Science and Technology.32, 3,
035006.
Research output:Contribution to journal ›Article› Academic› peer-review