Guest Lecture - Multiphoton Lithography in NLL: the past, the present, and the future

Research units CMME and BMBD of ENTEG organized an invited lecture by Savvas Papamakarios. Everyone interested in the topic is cordially invited.

Abstract

Multiphoton Lithography (MPL) is a laser-based additive manufacturing process that employs the non-linear properties of photon’s absorption and can result in the structuring of arbitrary geometries with a remarkable resolution that can reach up to a few tens of nm. This mask-less lithographic technique utilizes different photosensitive materials in order to realize a variety of applications such as micro-optical elements, metamaterials for electromagnetic, mechanical and phononic applications, as well as biomedical scaffolds for tissue engineering. The rapid growth of MPL is also highlighted, since it has continuously gained attractiveness over the past decade in certain research areas, further driven by the growing trend in 3D printing across industry and science. An exploration of future applications using novel approaches for scaling  up the process and technological prospects are also presented.

Short CV

Mr Savvas Papamakarios received his BSc degree from the Physics Department, University of Athens in Greece from the section of Condensed Matter Physics, focused on the study of Computational Electrodynamics using FDTD under the supervision of Prof. Kosmas Tsakmakidis. He received this MSc degree from the Physics Department, University of Crete in Greece, focused on Photonics & Nanoelectronics with the study of THz metamaterials for sensing applications at Non-Linear Lithography group at IESL-FORTH under the supervision of Dr Maria Farsari. He is currently a PhD candidate at Physics Department, University of Athens, and member of Non-Linear Lithography group, where his research is focused on the development of novel fabrication tools using additive manufacturing for structuring metamaterials that can be used for lasing applications.