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Lecture Caroline Whelan


11 January 2008 FWN-Building 5116.0116, Nijenborgh 4, 9747 AG, Groningen
Speaker: Dr. Caroline Whelan
Affiliation: IMEC, Leuven, Belgium
Title: Molecular engineering of surfaces for future device structures using self-assembled monolayers
Date: Fri Jan 11, 2008
Start: 14.00
Location: FWN-Building 5116.0116
Host: Petra Rudolf
Telephone: +31 50 363 4736


One approach to gaining insight into technologically relevant metal-organic and organic-inorganic interfaces involves studying model systems. To this end, the atomically controlled surface chemistry and structure of self-assembled monolayers (SAMs) provide a means of creating model organic and inorganic thin films in the nanometre regime. This presentation will focus on the preparation, characterization and application of thiol- and silane-derived SAMs on metal and dielectric surfaces of interest in semiconductor device manufacturing. As substrates for atomic layer deposition used in Cu metallization schemes, variation of SAM structure and chemistry facilitates tuning selectivity towards metal deposition. As passivation layers, SAMs enhance wire bonding. As potential barriers to Cu diffusion, SAMs are unique in terms of their composition and dimension. The challenge of characterizing these systems is demonstrated by high-resolution X-ray photoelectron spectroscopy and low-energy ion scattering studies. Overall, SAMs represent a novel approach to surface engineering for future device structures.

Last modified:22 October 2012 2.31 p.m.