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Lecture T. Fernandez Landaluce


08 July 2005 FWN-Building 5114.0004, Nijenborgh 4, 9747 AG, Groningen
Speaker: T. Fernandez Landaluce
Affiliation: IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
Title: Using self-assembled monolayers as model substrates for metal deposition: the influence of alkyl chain length
Date: Fri Jul 8, 2005
Start: 10.00
Location: FWN-Building 5114.0004
Host: P. Rudolf
Telephone: +31 50 363 4736 / 4974 (secr.)


Alkyltrichlorosilane (CH3-(CH2)n-SiCl3) derived self-assembled monolayers (SAMs) formed on SiO2 with the same methyl terminal group but different alkyl chain lengths (n=7,9,11,15,17) were investigated as organic substrates for studying the growth of WCN Cu diffusion barrier deposited by Atomic Layer Deposition (ALD). Contact angle measurements have been used to characterize SAM order macroscopically. Temperature programmed desorption reveals that the SAMs exhibit identical thermal desorption behaviour that shows stability well beyond the temperature required for subsequent ALD processing. The resulting metal/SAM samples were characterized using a range of analysis techniques including ellipsometry, contact angle and sheet resistance measurements, X-ray fluorescence, and high-resolution microscopy. Analyzing the different results, we find that WCN film growth is different depending on the alkyl chain length of the SAM substrate, attributed to structural effects within the SAMs. From n = 8 to 17, the degree of film order increases with increasing alkyl chain length.
Last modified:22 October 2012 2.30 p.m.