Prof. dr. H. Fairbrother, Johns Hopkins University, Baltimore, USA: Electron beam deposition for nanofabrication: insights from surface science
|28 April 2011||FWN-Building 5111.0080, Nijenborgh 4, 9747 AG, Groningen|
|Speaker:||Prof. dr. Howard Fairbrother|
|Affiliation:||Johns Hopkins University, Baltimore, USA|
Electron beam deposition for nanofabrication: insights from surface science
Electron beam induced deposition (EBID) is a direct-write lithographic technique where volatile precursors are decomposed by a focused electron beam in a low vacuum environment to create nanostructures. A major limitation of EBID is that metal-containing nanostructures deposited from organometallic precursors typically possess unacceptable levels of organic contamination. In this talk, I will describe how surface analytical techniques have provided mechanistic and kinetic insights into EBID. For organometallic precursors containing monodentate ligands EBID typically proceeds via release of a single ligand, analogous to chemical vapor deposition of the same precursor. For many precursors, subsequent reactions involve a competition between electron and thermal stimulated pathways. This mechanistic insight rationalizes the observed influence of substrate temperature on the film composition of EBID materials created from Pt(PF3)4 and metal carbonyls. Increased purity is expected for EBID films deposited at high substrate temperatures and low electron fluxes; the same conditions that reduce growth rates.
|Last modified:||12 September 2014 11.22 a.m.|