On the S/W stoichiometry and triboperformance of WSxC(H) coatings deposited by magnetron sputtering

Cao, H., Wen, F., Kumar, S., Rudolf, P., De Hosson, J. T. M. & Pei, Y., 15-May-2019, In : Surface & Coatings Technology. 365, p. 41-51 11 p.

Research output: Contribution to journalArticleAcademicpeer-review

WSxC(H) coatings were deposited on single crystal silicon(100) wafers by magnetron co-sputtering and reactive sputtering at various target-substrate distances. Upon increasing the distance, the stoichiometric S/W ratio increases from 0.51 to 1.89. Also, the porosity of coatings gradually augments and a columnar microstructure tends to form. Preferential sulfur resputtering rather than contaminations primarily accounts for the low S/W ratio. TEM reveals randomly oriented WS2(002) platelets in the WSxC coatings when deposited at a large distance, which is supported by XRD. The composite coatings exhibit a decreasing hardness and elastic modulus with increasing target-substrate distance. The triboperformance is strongly affected by the coating composition, the target-substrate distance and the testing environment. Cross-sectional TEM of formed tribofilms reveals an obvious reorientation of WS2(002) basal planes parallel to the plane of sliding, leading to an ultralow friction.

Original languageEnglish
Pages (from-to)41-51
Number of pages11
JournalSurface & Coatings Technology
Early online date17-Apr-2018
Publication statusPublished - 15-May-2019
Event14th International Conference on Plasma-Based Ion Implantation and Deposition (PBII and D) - Shanghai
Duration: 17-Oct-201720-Oct-2017


14th International Conference on Plasma-Based Ion Implantation and Deposition (PBII and D)



Event: Conference


  • WS2, Coating, Target-substrate distance, Magnetron cosputtering and reactive sputtering, Stoichiometry, Tribology, W-S-C, TRIBOLOGICAL PROPERTIES, THIN-FILMS, NANOCOMPOSITE COATINGS, ELECTRONIC-STRUCTURE, FRICTION, TUNGSTEN, WEAR, BEHAVIOR, MICROSTRUCTURE

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