On the S/W stoichiometry and triboperformance of WSxC(H) coatings deposited by magnetron sputteringCao, H., Wen, F., Kumar, S., Rudolf, P., De Hosson, J. T. M. & Pei, Y., 15-May-2019, In : Surface & Coatings Technology. 365, p. 41-51 11 p.
Research output: Contribution to journal › Article › Academic › peer-review
WSxC(H) coatings were deposited on single crystal silicon(100) wafers by magnetron co-sputtering and reactive sputtering at various target-substrate distances. Upon increasing the distance, the stoichiometric S/W ratio increases from 0.51 to 1.89. Also, the porosity of coatings gradually augments and a columnar microstructure tends to form. Preferential sulfur resputtering rather than contaminations primarily accounts for the low S/W ratio. TEM reveals randomly oriented WS2(002) platelets in the WSxC coatings when deposited at a large distance, which is supported by XRD. The composite coatings exhibit a decreasing hardness and elastic modulus with increasing target-substrate distance. The triboperformance is strongly affected by the coating composition, the target-substrate distance and the testing environment. Cross-sectional TEM of formed tribofilms reveals an obvious reorientation of WS2(002) basal planes parallel to the plane of sliding, leading to an ultralow friction.
|Number of pages||11|
|Journal||Surface & Coatings Technology|
|Early online date||17-Apr-2018|
|Publication status||Published - 15-May-2019|
|Event||14th International Conference on Plasma-Based Ion Implantation and Deposition (PBII and D) - Shanghai|
Duration: 17-Oct-2017 → 20-Oct-2017
14th International Conference on Plasma-Based Ion Implantation and Deposition (PBII and D)
17/10/2017 → 20/10/2017Shanghai
- WS2, Coating, Target-substrate distance, Magnetron cosputtering and reactive sputtering, Stoichiometry, Tribology, W-S-C, TRIBOLOGICAL PROPERTIES, THIN-FILMS, NANOCOMPOSITE COATINGS, ELECTRONIC-STRUCTURE, FRICTION, TUNGSTEN, WEAR, BEHAVIOR, MICROSTRUCTURE