Publication

Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene

Castellanos-Gomez, A., Wojtaszek, M., Tombros, N., Agrait, N., van Wees, B. J., Rubio-Bollinger, G. & Agraït, N., 5-Sep-2011, In : Small. 7, 17, p. 2491-2497 7 p.

Research output: Contribution to journalArticleAcademicpeer-review

APA

Castellanos-Gomez, A., Wojtaszek, M., Tombros, N., Agrait, N., van Wees, B. J., Rubio-Bollinger, G., & Agraït, N. (2011). Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene. Small, 7(17), 2491-2497. https://doi.org/10.1002/smll.201100733

Author

Castellanos-Gomez, Andres ; Wojtaszek, Magdalena ; Tombros, Nikolaos ; Agrait, Nicolas ; van Wees, Bart J. ; Rubio-Bollinger, Gabino ; Agraït, Nicolás. / Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene. In: Small. 2011 ; Vol. 7, No. 17. pp. 2491-2497.

Harvard

Castellanos-Gomez, A, Wojtaszek, M, Tombros, N, Agrait, N, van Wees, BJ, Rubio-Bollinger, G & Agraït, N 2011, 'Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene', Small, vol. 7, no. 17, pp. 2491-2497. https://doi.org/10.1002/smll.201100733

Standard

Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene. / Castellanos-Gomez, Andres; Wojtaszek, Magdalena; Tombros, Nikolaos; Agrait, Nicolas; van Wees, Bart J.; Rubio-Bollinger, Gabino; Agraït, Nicolás.

In: Small, Vol. 7, No. 17, 05.09.2011, p. 2491-2497.

Research output: Contribution to journalArticleAcademicpeer-review

Vancouver

Castellanos-Gomez A, Wojtaszek M, Tombros N, Agrait N, van Wees BJ, Rubio-Bollinger G et al. Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene. Small. 2011 Sep 5;7(17):2491-2497. https://doi.org/10.1002/smll.201100733


BibTeX

@article{9a67d4709e204d1ca10fda51e472e625,
title = "Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene",
abstract = "By mechanical exfoliation, it is possible to deposit atomically thin mica flakes down to single-monolayer thickness on SiO(2)/Si wafers. The optical contrast of these mica flakes on top of a SiO(2)/Si substrate depends on their thickness, the illumination wavelength, and the SiO(2) substrate thickness, and can be quantitatively accounted for by a Fresnel-law-based model. The preparation of atomically thin insulating crystalline sheets will enable the fabrication of ultrathin, defect-free insulating substrates, dielectric barriers, or planar electron-tunneling junctions. Additionally, it is shown that few-layer graphene flakes can be deposited on top of a previously transferred mica flake. Our transfer method relies on viscoelastic stamps, as used for soft lithography. A Raman spectroscopy study shows that such an all-dry deposition technique yields cleaner and higher-quality flakes than conventional wet-transfer procedures based on lithographic resists.",
keywords = "FEW-LAYER GRAPHENE, SINGLE-LAYER, FILMS, GRAPHITE, CRYSTALS, SILICON, SHEETS, SIO2",
author = "Andres Castellanos-Gomez and Magdalena Wojtaszek and Nikolaos Tombros and Nicolas Agrait and {van Wees}, {Bart J.} and Gabino Rubio-Bollinger and Nicol{\'a}s Agra{\"i}t",
year = "2011",
month = sep,
day = "5",
doi = "10.1002/smll.201100733",
language = "English",
volume = "7",
pages = "2491--2497",
journal = "Small",
issn = "1613-6810",
publisher = "WILEY-V C H VERLAG GMBH",
number = "17",

}

RIS

TY - JOUR

T1 - Atomically Thin Mica Flakes and Their Application as Ultrathin Insulating Substrates for Graphene

AU - Castellanos-Gomez, Andres

AU - Wojtaszek, Magdalena

AU - Tombros, Nikolaos

AU - Agrait, Nicolas

AU - van Wees, Bart J.

AU - Rubio-Bollinger, Gabino

AU - Agraït, Nicolás

PY - 2011/9/5

Y1 - 2011/9/5

N2 - By mechanical exfoliation, it is possible to deposit atomically thin mica flakes down to single-monolayer thickness on SiO(2)/Si wafers. The optical contrast of these mica flakes on top of a SiO(2)/Si substrate depends on their thickness, the illumination wavelength, and the SiO(2) substrate thickness, and can be quantitatively accounted for by a Fresnel-law-based model. The preparation of atomically thin insulating crystalline sheets will enable the fabrication of ultrathin, defect-free insulating substrates, dielectric barriers, or planar electron-tunneling junctions. Additionally, it is shown that few-layer graphene flakes can be deposited on top of a previously transferred mica flake. Our transfer method relies on viscoelastic stamps, as used for soft lithography. A Raman spectroscopy study shows that such an all-dry deposition technique yields cleaner and higher-quality flakes than conventional wet-transfer procedures based on lithographic resists.

AB - By mechanical exfoliation, it is possible to deposit atomically thin mica flakes down to single-monolayer thickness on SiO(2)/Si wafers. The optical contrast of these mica flakes on top of a SiO(2)/Si substrate depends on their thickness, the illumination wavelength, and the SiO(2) substrate thickness, and can be quantitatively accounted for by a Fresnel-law-based model. The preparation of atomically thin insulating crystalline sheets will enable the fabrication of ultrathin, defect-free insulating substrates, dielectric barriers, or planar electron-tunneling junctions. Additionally, it is shown that few-layer graphene flakes can be deposited on top of a previously transferred mica flake. Our transfer method relies on viscoelastic stamps, as used for soft lithography. A Raman spectroscopy study shows that such an all-dry deposition technique yields cleaner and higher-quality flakes than conventional wet-transfer procedures based on lithographic resists.

KW - FEW-LAYER GRAPHENE

KW - SINGLE-LAYER

KW - FILMS

KW - GRAPHITE

KW - CRYSTALS

KW - SILICON

KW - SHEETS

KW - SIO2

U2 - 10.1002/smll.201100733

DO - 10.1002/smll.201100733

M3 - Article

VL - 7

SP - 2491

EP - 2497

JO - Small

JF - Small

SN - 1613-6810

IS - 17

ER -

ID: 5406901